اکسید تالیوم (III)

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Thallium(III) oxide
Thallium(III) oxide
دیگر نام‌ها

thallium trioxide thallium sesquioxide

شناساگرها
شماره ثبت سی‌ای‌اس 1314-32-5
کم‌اسپایدر 7979876 ✔Y
شمارهٔ ئی‌سی 215-229-3
خصوصیات[۱]
فرمول مولکولی Tl2O3
جرم مولی 456.76 g/mol
شکل ظاهری colourless solid
چگالی 10.19 g/cm3 solid (22 °C)
دمای ذوب 717 °C (1323 °F)
دمای جوش
‎875 °C decomp.
انحلال‌پذیری در آب insoluble
ساختار
ساختار بلوری دستگاه بلوری مکعبی cI80[۲]
گروه فضایی Ia-3 No. 206
خطرات
طبقه‌بندی ئی‌یو not listed
لوزی آتش
Flammability code 0: Will not burn. E.g., waterHealth code 4: Very short exposure could cause death or major residual injury. E.g., VX gasReactivity code 0: Normally stable, even under fire exposure conditions, and is not reactive with water. E.g., liquid nitrogenSpecial hazards (white): no codeNFPA 704 four-colored diamond
0
4
0
LD50 44 mg/kg
به استثنای جایی که اشاره شده‌است در غیر این صورت، داده‌ها برای مواد به وضعیت استانداردشان داده شده‌اند (در 25 °C (۷۷ °F)، ۱۰۰ kPa)
 ✔Y (بررسی) (چیست: ✔Y/N؟)
Infobox references

اکسید تالیوم(III) (به انگلیسی: Thallium(III) oxide) با فرمول شیمیایی Tl۲O۳ یک ترکیب شیمیایی است. که جرم مولی آن 456.76 g/mol می‌باشد. شکل ظاهری این ترکیب، جامد بی‌رنگ است.

جستارهای وابسته[ویرایش]

منابع[ویرایش]

  1. ↑ Weast, Robert C., ed. (1981). CRC Handbook of Chemistry and Physics (62nd ed.). Boca Raton, FL: CRC Press. p. B156. ISBN 0-8493-0462-8..
  2. ↑ Otto H.H., Baltrasch R., Brandt H.J. (1993). "Further evidence for Tl3+ in Tl-based superconductors from improved bond strength parameters involving new structural data of cubic Tl2O3". Physica C. 215 (1–2): 205. doi:10.1016/0921-4534(93)90382-Z.
  • «IUPAC GOLD BOOK». دریافت‌شده در ۱۸ مارس ۲۰۱۲.
Thallium(III) oxide
Thallium(III) oxide
Names
Other names
thallium trioxide, thallium sesquioxide
Identifiers
3D model (JSmol)
ChemSpider
ECHA InfoCard 100.013.846
EC Number
  • 215-229-3
Properties[1]
Tl2O3
Molar mass 456.76 g/mol
Appearance very dark, nearly black solid
Density 10.19 g/cm3, solid (22 °C)
Melting point 717 °C (1,323 °F; 990 K)
Boiling point 875 °C (1,607 °F; 1,148 K) (decomposes)
insoluble
+76.0·10−6 cm3/mol
Structure
Cubic, cI80[2]
Ia-3, No. 206
Hazards
not listed
NFPA 704 (fire diamond)
Flammability code 0: Will not burn. E.g. waterHealth code 4: Very short exposure could cause death or major residual injury. E.g. VX gasReactivity code 0: Normally stable, even under fire exposure conditions, and is not reactive with water. E.g. liquid nitrogenSpecial hazards (white): no codeNFPA 704 four-colored diamond
0
4
0
Lethal dose or concentration (LD, LC):
44 mg/kg (oral, rat)
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
☒N verify (what is ☑Y☒N ?)
Infobox references

Thallium(III) oxide, also known as thallic oxide, is a chemical compound of thallium and oxygen. It occurs in nature as the rare mineral avicennite.[3] Its structure is related to that of Mn2O3 which has a bixbyite like structure. Tl2O3 is metallic with high conductivity and is a degenerate n-type semiconductor which may have potential use in solar cells.[4] A method of producing Tl2O3 by MOCVD is known.[5] Any practical use of thallium(III) oxide will always have to take account of thallium's poisonous nature. Contact with moisture and acids may form poisonous thallium compounds.

Production

It is produced by the reaction of thallium with oxygen or hydrogen peroxide in an alkaline thallium(I) solution. Alternatively, it can be created by the oxidation of thallium(I) nitrate by chlorine in an aqueous potassium hydroxide solution.[6]

References

  1. ^ Weast, Robert C., ed. (1981). CRC Handbook of Chemistry and Physics (62nd ed.). Boca Raton, FL: CRC Press. p. B156. ISBN 0-8493-0462-8..
  2. ^ Otto H.H.; Baltrasch R.; Brandt H.J. (1993). "Further evidence for Tl3+ in Tl-based superconductors from improved bond strength parameters involving new structural data of cubic Tl2O3". Physica C. 215 (1–2): 205. doi:10.1016/0921-4534(93)90382-Z.
  3. ^ http://www.handbookofmineralogy.org/pdfs/avicennite.pdf Handbook of Mineralogy
  4. ^ Phillips R. J.; Shane M. J.; Switzer J. A. (1989). "Electrochemical and photoelectrochemical deposition of Thallium(III) Oxide thin films". Journal of Materials Research. 4 (04): 923. doi:10.1557/JMR.1989.0923.
  5. ^ D. Berry; R. T. Holm; R. L. Mowery; N. H. Turner & M. Fatemi (1991). "Thallium(III) Oxide by Organometallic Chemical Vapor Deposition". Chemistry of Materials. 3 (1): 72–77. doi:10.1021/cm00013a019.
  6. ^ Georg Brauer; Handbuch der präparativen anorganischen Chemie, Band 2, S.884; ISBN 3-432-87813-3 (in German)


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